High P EN
High phosphorus electroless nickel is a technical deposit composed of nickel and phosphorus (10.5-12% ). It produces a non-magnetic substrate and provides excellent corrosion protection.
NI 70H RoHS COMPLIANCE, HIGH PHOSPHOROUS ELECTROLESS NICKEL PROCESS
Physical Properties:
NI 70H MAKE UP: Liquid
NI 70H PART I : Liquid
NI 70H PART II: Liquid
Description
NI 70H is a lead and cadmium-free, fast-speed RoHS Compliance, high phosphorous electroless nickel process designed to produce deposits exhibiting excellent lubricity and corrosion resistance.
NI 70H process chemically deposits a uniform nickel alloy containing 10.5 ~ 12.0% of phosphorous content. It is capable of plating on steel, aluminum, stainless steel and copper alloys etc.
Equipment
Plating units normally used for hot acid electroless nickel solutions are suitable for use with NI 70H solution. Exhaust ventilation is recommended to remove steam and solution mist which are caused by agitation or gassing of the solution which may contain nickel salts. The solutions should be covered when it contains no work and is at or near operating temperature.
Tanks: Tanks fabricated from high density polypropylene are suggested. An excellent plating arrangement is a twin-tank setup with one tank held in reserve. If the nickel begins to deposit on the production tank, the solution can immediately be filtered into the stand by tank, chemically adjusted and operated. Therefore, the twin-tank arrangement can eliminate costly downtime.
Heating: Electric immersion heaters fabrication from 304 or 316 stainless steel, titanium or anodised titanium, or steam Teflon supercoil are satisfactory for heating the solution.
Agitation: Clean, mild air agitation or mechanical work rod agitation (vertical preferred) is satisfactory. The rate of agitation can affect the deposition rate.
Filtration: Continuous filtration, though not necessary is suggested for optimum results. A 1-micron bag-type filter provide adequate filtration for most installations. Use periodic filtration if continuous filtration is not feasible.